HJT High Efficiency Solar Cell Manufacturing Whole-line Solution
The Whole-line Solution for HJT High Efficiency Cell Manufacturing, which completely covers the four processes of HJT cell production( as shown in the figure below), is independently developed by Maxwell. Through the manufacturing process for larger, thinner and half-sized wafers, the Whole-line Solution combines innovative process route, integrated MES intelligent system to further improve the conversion efficiency, yield and production capacity of solar cells, while reducing the production cost.
Process Flow
01
Texturing
02
Silicon-Based Film Deposition (PECVD)
03
Transparent Conductive Film Deposition (PVD)
04
Screen Printing
Advantages of the Whole-line Solution
Texturing
Equipped with two kinds of pre-clean process：Precln#1(O₃)→ SDE → Precln#2(H₂O₂)
PECVD Equipment
Fully automatic processes for double-sided coating, continuous coating and RPS self-cleaning, with high production capacity and no need of overhead crane
PVD Equipment
Continuous complete the TCO coating of frontside and backside coating; High production capacity, with 8 process units (PU) improving TCO coating process flexibility, no need of overhead crane, and coating utilization rate up to 80%
With functions of data collection, production line monitoring, production line management & control, and statistical analysis, the system can realize mass production piece-level tracking and trace the production process of each solar cell
Process 1 Texturing
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HJT Texturing Equipment__HJ-TEX-182/210
In this equipment, the surface of silicon wafer is etched into pyramid texture structure with acid and alkali liquid, and then cleaned and dried.
Equipment Parameters
Equipment Advantages
Compatible with different kinds of wafers; with large capacity and full customization
Excellent process controllability, with ( Feed and Bleed Mode )
Complete data collection (Lot Log, ID tracking, recording curve, etc.）
Process Flow
Others
A complete set of rework cleaning machine, chain type cleaning machine can be provided according to customer demand.
Process 2 PECVD
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PECVD Coating Equipment__Maxwell MV-LH06
A set of inline non-stop PECVD coating equipment, depositing I layer & doping amorphous silicon film/microcrystalline silicon film on front & backside of wafer
Equipment Parameters
Equipment Advantages
Inline multi chamber quasi dynamic PECVD coating technique
Layered high quality amorphous silicon passivation coating technology
Composite tray design with large size, light load, low thermal expansion coefficient and high flatness
Inline corrosion resistant magnetic fluid & vacuum transfer for large size tray
RF quick ignition setting and real-time plasma glow monitoring
Process Flow
Process 3 PVD
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HJT PVD Equipment__Maxwell P6
A set of horizontal on-line magnetron sputtering continuous coating equipment, with capability of simultaneously double-sided coating.
Equipment Parameters
Equipment Advantages
Maximum Capacity（14400pcs@ half-size G12, 600mw for single equipment)
Composite structural tray design with large size, light load, low thermal expansion coefficient and high flatness specially for PVD coating of HJT cell
Design of PVD cavity structure with high productivity and low debris rate for HJT cell
PVD cathode structure design of high magnetism, low temperature and high sputtering rate
Design of fast and uniform heating unit
Design of PVD cathode cavity with good uniformity
High-quality TCO film coating technology with short CT for PVD online
Process Flow
Process 4 Screen Printing
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The Complete Line of Screen Printing Equipment for HJT Cell MW-XDL-DP（HJT）
The equipment is utilized for screen printing test, curing and LED of the HJT cell.
Equipment Parameters
Equipment Advantages
Compatible with MES, UPS and RFID functions
High accuracy and large capacity equipment compatible with half-cell
Equipped with unmanned automation for the whole line
Whole line made by Maxwell, even the testing devices
